Toshiba demos the world’s first application in 20nm process technology
Toshiba today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world’s first 20nm-scale generation process technology.
Toshiba will further improve the performance of the molecular resist and apply it to the fabrication of 20nm-scale generation LSIs.
According to the International Technology Roadmap for Semiconductors (ITRS), high volume production of this generation is expected to start in 2013.
